Substrate-free silicon nitride films for metamaterial absorbers designed with Lorentz quadratic model

Zhigang Li, Jiarui Jia, Wenjing Jiang, Wen Ou, Bo Wang, Xubiao Peng, Hao Wu, Qing Zhao*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

1 引用 (Scopus)

摘要

4-inch wafer-level substrate-free low-stress silicon nitride (SiNx) thin films are demonstrated in this paper for fabrication of terahertz (THz) metadevices. The chemical compositions, surface roughness, and THz properties of the SiNx film are investigated. Narrowband metamaterial absorbers designed with a Lorentz quadratic model are fabricated to evaluate the performance of the SiNx films. The new model reveals the quantitative relationship between the parameters of the model and the geometric parameters of the absorber. The performance of the absorber agrees well with the model which exhibits a full-width at half-maximum (FWHM) ≈ 0.11 THz and near-unity absorption (≈ 94%) at fc = 1.13 THz. Our results show that the wafer-level SiNx films will facilitate the development of large-scale, sophisticated-substrate-free THz metadevices. Moreover, the employed Lorentz model as well as its quadratic model can be a novel and practical method for the design of THz metadevices.

源语言英语
文章编号107868
期刊Materials Science in Semiconductor Processing
169
DOI
出版状态已出版 - 1月 2024

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