TY - JOUR
T1 - How to decorate graphene film into silicon nanowires array for maximizing long-wave infrared photodetection?
AU - Zou, Guanzhen
AU - Liu, Mingzhu
AU - Yang, Shengyi
AU - Zia, Ayesha
AU - Wang, Ying
AU - Ge, Zhenhua
AU - Zhu, Mengchun
AU - Zou, Bingsuo
AU - Jiang, Yurong
N1 - Publisher Copyright:
© 2025 Elsevier Ltd
PY - 2025/11/15
Y1 - 2025/11/15
N2 - As an exciting material with excellent electrical and optical properties, graphene is widely used in optoelectronics, especially for its absorption band into Terahertz region, therefore it can be used for long-wave infrared (LWIR) photodetectors based on silicon nanowires (Si-NWs) array. How to design the Si-NWs array to maximize the absorption for long-wave infrared (i.e. 8-14 μm) photodetection? To answer this question, in this work, the absorption for LWIR light by Si-NWs array, where both graphene and Au films are filled in its interstitial spaces within Si-NWs array as the active layers, is firstly simulated with finite-difference time-domain (FDTD) method by considering the anisotropic properties of graphene, and then experiments are done to confirm our simulation results. The effective area of graphene on the Si-NWs increases with the height of graphene film filled in the interstitial spaces of Si-NWs, thus to enhance the absorption of LWIR light. A perfect bimodal absorption-peak is obtained in the LWIR region from structure Si-NW/graphene/Au, and our simulation on photodetector Si-NWs/graphene/Au shows a responsivity R of 1.79 mA/W with a specific detectivity (D∗) of 8.41 × 108 Jones under 25 mW/cm2 10 μm illumination. Also, a specific detectivity of 1.1571 × 108 Jones is obtained from our photodetector Ag/Si-NWs/rGO/Au at room temperature, obviously, it is in agreement with our simulation results since some defects are introduced into both Si-NWs array and rGO during their actual manufacturing process. Thus, this work provides a groundwork for graphene-based long-wave infrared optoelectronic devices.
AB - As an exciting material with excellent electrical and optical properties, graphene is widely used in optoelectronics, especially for its absorption band into Terahertz region, therefore it can be used for long-wave infrared (LWIR) photodetectors based on silicon nanowires (Si-NWs) array. How to design the Si-NWs array to maximize the absorption for long-wave infrared (i.e. 8-14 μm) photodetection? To answer this question, in this work, the absorption for LWIR light by Si-NWs array, where both graphene and Au films are filled in its interstitial spaces within Si-NWs array as the active layers, is firstly simulated with finite-difference time-domain (FDTD) method by considering the anisotropic properties of graphene, and then experiments are done to confirm our simulation results. The effective area of graphene on the Si-NWs increases with the height of graphene film filled in the interstitial spaces of Si-NWs, thus to enhance the absorption of LWIR light. A perfect bimodal absorption-peak is obtained in the LWIR region from structure Si-NW/graphene/Au, and our simulation on photodetector Si-NWs/graphene/Au shows a responsivity R of 1.79 mA/W with a specific detectivity (D∗) of 8.41 × 108 Jones under 25 mW/cm2 10 μm illumination. Also, a specific detectivity of 1.1571 × 108 Jones is obtained from our photodetector Ag/Si-NWs/rGO/Au at room temperature, obviously, it is in agreement with our simulation results since some defects are introduced into both Si-NWs array and rGO during their actual manufacturing process. Thus, this work provides a groundwork for graphene-based long-wave infrared optoelectronic devices.
KW - Bimodal absorption peak
KW - Finite-difference time-domain (FDTD) simulations
KW - Long-wave infrared light
KW - Reduced graphene oxide
KW - Silicon nanowires (Si-NWs) array
UR - http://www.scopus.com/pages/publications/105010059561
U2 - 10.1016/j.mssp.2025.109850
DO - 10.1016/j.mssp.2025.109850
M3 - Article
AN - SCOPUS:105010059561
SN - 1369-8001
VL - 199
JO - Materials Science in Semiconductor Processing
JF - Materials Science in Semiconductor Processing
M1 - 109850
ER -