TY - JOUR
T1 - In-situ disinfection by flexible surface dielectric barrier discharge plasma film
T2 - discharge modes and mechanisms
AU - Zhang, Liyang
AU - Zhang, Xu
AU - Tie, Jinfeng
AU - Luo, Haiyun
AU - Guo, Yuntao
AU - Zhou, Qun
N1 - Publisher Copyright:
© 2025 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
PY - 2025/3/24
Y1 - 2025/3/24
N2 - In this work, a surface-dielectric-barrier-discharge (SDBD) based flexible plasma film (FPF) was established and tested for in-situ surface disinfection. The discharge product mode (i.e. O3 mode and NOx mode) was controlled by the applied voltage and verified by in situ gas product quantification. For in situ disinfection, the NOx mode shows significantly higher bactericidal efficiency than the O3 mode, and the FPF achieves ∼3.5 logs and >6 logs of bacterial reduction with 3 and 5 min of plasma exposure in the NOx mode, respectively. The underlying mechanism is investigated. In the O3 mode, the heating effect of the plasma plays either a negligible or moderate role in bacterial inactivation, depending on the applied voltage. In the NOx mode, both high temperature and long-lived species can play a role, while it is speculated that short-lived species are primarily responsible for the high-order bactericidal rate (>3 logs), with atomic oxygen likely playing an important role. As revealed by scanning electron microscopy and Fourier-transform infrared (FT-IR) spectroscopy, the NOx mode can lead to more pronounced bacterial etching and nitrification compared to the O3 mode, accounting for its superior disinfection performance. By examining the time-dependent FT-IR infrared spectra of treated bacteria, it is found that nitrification is the dominant spectral variation, and the ratio of infrared bands at 1354 and 1654 cm−1 can serve as a positive indicator of disinfection efficiency. This study can provide deeper insights into the discharge mode, disinfection performance, and bactericidal mechanisms of the SDBD-based FPF, offering guidance for the control, evaluation, and future applications of this technology.
AB - In this work, a surface-dielectric-barrier-discharge (SDBD) based flexible plasma film (FPF) was established and tested for in-situ surface disinfection. The discharge product mode (i.e. O3 mode and NOx mode) was controlled by the applied voltage and verified by in situ gas product quantification. For in situ disinfection, the NOx mode shows significantly higher bactericidal efficiency than the O3 mode, and the FPF achieves ∼3.5 logs and >6 logs of bacterial reduction with 3 and 5 min of plasma exposure in the NOx mode, respectively. The underlying mechanism is investigated. In the O3 mode, the heating effect of the plasma plays either a negligible or moderate role in bacterial inactivation, depending on the applied voltage. In the NOx mode, both high temperature and long-lived species can play a role, while it is speculated that short-lived species are primarily responsible for the high-order bactericidal rate (>3 logs), with atomic oxygen likely playing an important role. As revealed by scanning electron microscopy and Fourier-transform infrared (FT-IR) spectroscopy, the NOx mode can lead to more pronounced bacterial etching and nitrification compared to the O3 mode, accounting for its superior disinfection performance. By examining the time-dependent FT-IR infrared spectra of treated bacteria, it is found that nitrification is the dominant spectral variation, and the ratio of infrared bands at 1354 and 1654 cm−1 can serve as a positive indicator of disinfection efficiency. This study can provide deeper insights into the discharge mode, disinfection performance, and bactericidal mechanisms of the SDBD-based FPF, offering guidance for the control, evaluation, and future applications of this technology.
KW - disinfection
KW - flexible surface dielectric barrier discharge
KW - NO mode
KW - O mode
UR - http://www.scopus.com/pages/publications/85217066547
U2 - 10.1088/1361-6463/adabf2
DO - 10.1088/1361-6463/adabf2
M3 - Article
AN - SCOPUS:85217066547
SN - 0022-3727
VL - 58
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 12
M1 - 125202
ER -