Fabrication and characterization of bilayer graphene transistors

Kaige Yang, Xuge Fan, Jie Ding*

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

The emergence of graphene has brought hope for the continued scaling of transistors. In this study, we detailed the fabrication process of the back-gate bilayer graphene transistor and fully analysed its electrical properties. The PMMA wet transfer is used to obtain the bilayer graphene film. The results indicate that the contact between graphene and metal is ohmic. The transfer characteristic curve shows a large on-state current (ION) up to 2.34 mA but a minimal current switching ratio because the bandgap of the bilayer graphene is not fully opened. The device shows P-type properties because of the contamination during the wet transfer process. The electrical properties of the back-gate bilayer graphene transistor are fully analysed. The results contribute to a deeper understanding of bilayer graphene's electronic characteristics and lay the groundwork for the future research.

Original languageEnglish
Article number012026
JournalJournal of Physics: Conference Series
Volume2982
Issue number1
DOIs
Publication statusPublished - 2025
Externally publishedYes
Event26th Annual Conference and 15th International Conference of Chinese Society of Micro-Nano Technology, CSMNT 2024 - Taiyuan, China
Duration: 20 Sept 202423 Sept 2024

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